Among all application industries,the semiconductor industry has the most demanding quality requirements for target sputtering films.The crystalline particle diameter and uniformity of the target have been considered to be the key factors affecting the film deposition rate
Flat-panel displays (FPD) have greatly impacted the computer monitor and TV markets,which are dominated by cathode ray tubes (CRT),and will also drive the technology and market demand for ITO targets
In terms of storage technology,the development of high-density,high-capacity hard disks requires a large number of giant magnetoresistive film materials.CoF~Cu multilayer composite film is a widely used giant magnetoresistive film structure today
Metal sputtering targets are usually made of high-purity metal.They are the most widely used and basic coating materials for other sputter deposition techniques,such as gold,silver,platinum,aluminium,Cu,Ni,Ti,etc
Alloy sputtering targets are material composed of a metal and other metals or non-metals,while still showing some metallic characteristics,including TiAl,NiCr,AuPt,AlSiCu,etc
Ceramic sputtering targets are made of compound material,including oxide targets,sulfide targets,selenide targets,boride targets,carbide targets,silicide targets,telluride targets,nitride targets,fluoride targets,such as ITO,IZO,Al2O3,CuS,ZnS,LiF,SiC,Si3N4,etc
Pure metal evaporation materials are generally used for metal reflection film,vacuum coating and other applications,we can provide various sizes according to customer requirements
Compound evaporation materials,such as fluoride,sulfide,tellurium,etc.,are commonly used to make transparent films,optical filters,and plastic substrate coatings
Evaporation Sources products contain crucibles,boats and thermal filament.These are specifically designed for OLED/multiple coating applications